technology hard true/false

Extreme Ultraviolet (EUV) lithography uses 13.5nm wavelength light for patterning sub-7nm features.

  1. True
  2. False

Answer: True

EUV lithography (ASML) enables single-patterning of sub-7nm features vs multi-patterning with DUV. Challenges: light source power, mask defects, resist sensitivity. Critical technology for leading-edge chips; India monitors for future capability development.

Topic Semiconductor Technology
Exam Relevance UPSC, Banking, SSC

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